Posts Tagged ‘Webinar’

The Technical Committee on Emerging Plasma Nanotechnologies of the IEEE Nanotechnology Council will hold its fourth online workshop Wed Feb 8^th 2023, at 5:00-7:00 pm CET, Paris time zone, (which will be at 8:00 am PST (Bay Area), 10:00 am CST (Chicago), 11:00 am EST (NYC), 1:00 am(+1day) JST). It will be virtual with a very exciting program with speakers either from academia and attendees from academia, national laboratories and industry. Attendance is free but registration is necessary.  Use the form below.

This time we have a diverse set of topics spanning biomedical plasma technology to the simulation of charged particle interactions with surfaces. Our speaker lineup includes:

• Prof. Andrew Gibson (Ruhr University)  “Chemical kinetics in atmospheric pressure plasmas: implications for biomedicine and materials processing”

• Prof. Steve Shannon (NCSU)  “Ion-material interactions for critical etch processes”

• Xiuyao Lang, Youhwan Jo, and Prof. KJ Cho (University of Texas at Dallas) “TDDFT study of excited electron dynamics and MD study of ion collisions with surface for plasma nanotechnology”

Agenda: Talks 30 min + 5 min for questions

• Welcome 17:00-17:05 CET 2/8 [1:00 am-1:05 JST 2/9, 10:00am-10:05  CDT 2/8]
• Prof. Gibson 17:05-17:40 CET 2/8 [1:05-1:40 JST, 10:05-10:40  CDT]
• Prof. Shannon 17:40-18:15 CET 2/8 [1:40-2:15 JST, 10:40-11:15  CDT]
• Lang, Jo and Cho 18:15 – 18:50 CET 2/8  [2:15-2:50 JST, 11:15-11:50  CDT]

Organizers:
Dr. Peter Ventzek
Prof. Uros Cvelbar
Dr. Kremena Makasheva
Committee Chair: Prof. Seiji Samukawa

Use this form to register:

It is a pleasure to announce the third meeting (online workshop) of the Technical Committee on Emerging Plasma Nanotechnologies (TC 17) of the IEEE Nanotechnology Council. This third edition, planned 9/27 Tuesday 12 noon CET Berlin, 9/27 Tuesday 7 pm JST Tokyo 9/27 and 5 am CDT (Chicago) 9/27 . It will be virtual with a very exciting program with speakers either from academia, national laboratories and industry. It is free but registration is necessary.

This time we shift the focus to plasma surface interactions and plasma modeling and simulation. The list of the speakers is the following:

• Dr. Fiorenza Fanelli, National Research Council (CNR), Institute of Nanotechnology (NANOTEC), Bari, Italy
  “Atmospheric pressure plasma surface processing of materials for environmental protection and remediation”
• Dr. Richard Clergereaux, Centre National de la Recherche Scientifique (CNRS), Laboratory of Plasma and Conversion of Energy (LAPLACE), University of Toulouse, Toulouse, France
  “Aerosol-assisted plasma processes: thin film deposition and plasma behaviors”
• Dr. Diana Mihailova, CEO, Plasma Matters B.V., Eindhoven University of Technology (TUe), Eindhoven, The Netherlands
  “A User Perspective on Plasma Modeling and Simulation”

Agenda: Talks 30 min + 5 min for questions:

• Welcome 12 noon-12:05 CET 9/27 [7:00 pm-7:05 JST, 5:00am-5:05 CDT]
• Fanelli 12:05-12:40 CET 9/27 [7:05-7:40 JST, 5:05-5:40 CDT]
• Clergereaux 12:40-13:15 CET 9/27 [7:40-8:15 JST, 5:40-6:15 CDT]
• Dr. Mihailova 13:15 – 13:50 CET 9/27 [8:15-8:50 JST, 6:15-6:50 CDT]

Organizers:
Dr. Peter Ventzek
Prof. Uros Cvelbar
Dr. Kremena Makasheva
Committee Chair: Prof. Seiji Samukawa

Use this form to register:

It is a pleasure to announce the second meeting (online workshop) of the newborn Technical Committee on Emerging Plasma Nanotechnologies of the IEEE Nanotechnology Council. This second edition, planned 6 pm CST May 10, 1 am (next day, May 11) CET and 8 am (next day, May 11) JST. It will be virtual with a very exciting program with speakers either from academia and industry. It is free but registration is necessary.

Register here.

This time we have a continued focus on advanced device development/plasma processes including AI/ML/big data. The list of the speakers is the following:

• Prof. Kenji Ishikawa, Nagoya University
  Nanoscale etching technologies for nitrides and carbides

• Prof. and Dean Masaharu Shiratani, Kyushu University
  Identification of key plasma process parameters using support vector machine

• Dr. Prem Panneerchelvam, KLA
  Etch profile simulations to address challenges in plasma based nanofabrication

Agenda: Talks 30 min + 5 min for questions

• Welcome 6-6:05 CST
• Prof. Ishikawa 6:05-6:40 CST
• Prof. Shiratani 6:40-7:15 CST
• Dr. Paneerchelvam 7:15 – 7:50 CST

Organizers:

Dr. Peter Ventzek
Prof. Uros Cvelbar
Dr. Kremena Makasheva
Committee Chair: Prof. Seiji Samukawa

Use this form to register:

Meeting is  over

Dear Colleagues,

It is a pleasure to announce the first meeting of the newborn Technical Committee on Emerging Plasma Nanotechnologies of the IEEE Nanotechnology Council. This first edition, planned for February, 9th, 2022, will start at 5:00pm CET, Paris time zone, (which will be 8:00am PST, 11:00am EST, 1:00am(+1day) JST). It will be virtual with a very exiting program with speakers either from academia and industry. This time we have a special focus on advanced device development/plasma processes including AI/ML/big data. The list of the speaker is the following:

5:00 – 5:45 pm (CET)
Prof. Seiji Samukawa, Tohoku University, Japan
Introduction of IEEE Nanotechnology Council and Emerging Plasma Nanotechnologies Technical Committee
Plasma Nanotechnology Introduction/Background

5:45 – 6:20 pm (CET)
Prof. Masaru Hori, Nagoya University, Japan
Internal parameter analysis by random forest model in PECVD of amorphous carbon films

6:20 – 6:55 pm (CET)
Dr. Thorsten Lill, Lam Research, USA
Plasma technologies for etching of 3D integrated memories

6:55 – 7:30 pm (CET)
Dr. Alok Ranjan & Dr. Shyam Sridhar, Tokyo Electron America, Inc., USA
Emerging plasma technologies enabling logic and memory scaling roadmaps

Organizers:
Dr. Peter Ventzek
Prof. Uros Cvelbar
Dr. Kremena Makasheva

Members of TC17 Emerging Plasma Nanotechnologies Technical Committee, IEEE Nanotechnology Council