It is a pleasure to announce the second meeting (online workshop) of the newborn Technical Committee on Emerging Plasma Nanotechnologies of the IEEE Nanotechnology Council. This second edition, planned 6 pm CST May 10, 1 am (next day, May 11) CET and 8 am (next day, May 11) JST. It will be virtual with a very exciting program with speakers either from academia and industry. It is free but registration is necessary.
Register here.
This time we have a continued focus on advanced device development/plasma processes including AI/ML/big data. The list of the speakers is the following:
- Prof. Kenji Ishikawa, Nagoya University
Nanoscale etching technologies for nitrides and carbides
- Prof. and Dean Masaharu Shiratani, Kyushu University
Identification of key plasma process parameters using support vector machine
- Dr. Prem Panneerchelvam, KLA
Etch profile simulations to address challenges in plasma based nanofabrication
Agenda: Talks 30 min + 5 min for questions
- Welcome 6-6:05 CST
- Prof. Ishikawa 6:05-6:40 CST
- Prof. Shiratani 6:40-7:15 CST
- Dr. Paneerchelvam 7:15 – 7:50 CST
Organizers:
Dr. Peter Ventzek
Prof. Uros Cvelbar
Dr. Kremena Makasheva
Committee Chair: Prof. Seiji Samukawa
Meeting is over
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